High-k Metal Gate Precursor Market grow at 22% CAGR from 2016 to 2024

Global high-k and ALD/CVD metal precursor market size is projected to exceed USD 965 million by the year 2024, with a CAGR estimation of 17.8% over 2016-2024. Global high-k and ALD/CVD metal precursor market is characterized by notable number of players offering diverse and cost-effective solutions.

The ever-growing demand for highly efficient semiconductor devices will propel high-k and ALD/CVD metal precursor market. Subject to the advantages of compositional control and industrial scaling, deposition processes such as metal organic chemical vapor deposition have gained traction, as opposed to the conventional physical vapor deposition techniques. This will significantly drive high-k & ALD/CVD metal precursor industry.

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The Asia Pacific and BRIC nations experience an ever-growing demand for efficient semiconductors subject to the high utilization of electronic devices in the region. On account of this, China high-k & ALD/CVD metal precursor market, having accounted for more than 35% of the overall share in 2015, will experience heavy gains over 2016-2024.

Taiwan is estimated to host the largest number of chip makers and a huge customer pool, owing to which the country is touted to be a major revenue pocket for Asia Pacific industry.

U.S. high-k and ALD/CVD metal precursor market size was over USD 30 million in 2015. The regional manufacturers have scaled down wafer processing to 450 mm, which will propel U.S. microelectronics and nanotechnology industries. High demand from the aforementioned sectors and the complexities involved in manufacturing semiconductors will drive U.S. market.

Subject to technological trends, high-k and ALD/CVD metal precursor industry encompasses gate, memory/capacitor, and interconnect technology. Gate based high-k and ALD/CVD metal precursor industry was worth USD 33 million in 2015, and is slated to grow at a CAGR of 23% over 2016-2024.

This technology is likely to replace silicon oxide in the 65 nm CMOS devices. In addition, the demand for timely and accurate translation of a large amount of content will fuel gate based technology.

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Interconnect technology contributed to more than 45% of the overall high-k & ALD/CVD metal precursor market in 2015, thereby dominating the technology landscape. High demand for new memory technologies and non-planar transistors will lead to thin film material suppliers gaining renewed opportunities, which will stimulate interconnect based high-k and ALD/CVD metal precursor industry over the years to come.

Major participants operating in worldwide high-k and ALD/CVD metal precursor market include Air Liquide, Air Products & Chemicals, ATMI Inc., Adeka, UPChem, and Dow Chemical. In a bid to innovate products and achieve high profit margins, companies adopt growth strategies such as joint ventures, collaborations, and mergers & acquisitions to strengthen their presence across the supply chain and consolidate their position in the global industry.

Table Content Of High-k and ALD/CVD Metal Precursor Market:

Chapter 1. Methodology and Scope

1.1. Research Methodology

1.1.1. Initial data exploration

1.1.2. Statistical model and forecast

1.1.3. Industry insights and validation

1.1.4. Research scope & assumptions

1.2. Data Sources

1.2.1. Primary

1.2.2. Secondary

Chapter 2. Executive Summary

2.1. High-k and ALD/CVD metal precursor industry 3600 synopsis, 2013 - 2024

2.1.1. Business trends

2.1.2. Regional trends

2.1.3. Product trends

Chapter 3. High-k and ALD/CVD Metal Precursor Industry Insights

3.1. Industry segmentation

3.2. Industry Size and forecast, 2013 - 2024

3.3. Industry ecosystem analysis

3.3.1. Precursors market trends

3.4 Technological & innovation landscape

3.5 Industry Impact forces

3.5.1 Growth drivers

3.5.1.1 Rising demand for sophisticated products

3.5.1.2 Superior customer service

3.5.2 Industry pitfalls & challenges

3.5.2.1 High auxiliary expenses

3.6. Growth potential analysis

3.7. Porter’s analysis

3.8. Competitive landscape, 2015

3.8.1. Strategy dashboard

3.9. PESTEL analysis

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